Hasselblad 501 C/M, Zeiss Makro-Planar 120/4, Fuji Neopan Acros

Leica MP, Summilux 50, Fuji Neopan Acros

Linhof Master Technika, Rodenstock Apo-Sironar S 150, Ilford FP4+
aperture: f8.0
exposure: 1/15 second
developed in Pyrol (P1) for 12 minutes

Some quick shots from this month.

Leica M2, Summicron 50, Kodak Tri-x (in Xtol).

Voigtländer Bessa III, Fuji Neopan Acros (1h in Rodinal 1:100).

Hasselblad 501 C/M, Zeiss Makro-Planar 120/4, Fuji Neopan Acros

Hasselblad 501 C/M, Zeiss T* Planar 80/2.8, Kodak Tri-x

Linhof Master Technika, Rodenstock Apo-Sironar S 150, Ilford FP4+
aperture: f11.0
exposure: 1/30 second
developed in Pyrol (P1) for 13 minutes

Linhof Master Technika, Rodenstock Apo-Sironar S 150, Kodak Portra 400
aperture: f11.0
exposure: 1/60 second
developed with Tetenal C-41

Leica MP, Summicron 35, Fuji Acros

Hasselblad 501 C/M, Zeiss T* Planar 80, Fuji Neopan Acros
Printed on Foma MG 532 II with Moersch Easy-Lith, gold-toned.

Berlin, 2011

Leica MP, Summilux 50, Fuji Acros

Austria, March 2012

From my first Lith-printing session.

Hasselblad 501 C/M, Zeiss Makro-Planar 120/4, Ilford HP5+
Printed on Foma MG 532 II with Moersch Easy-Lith.